型号 Model
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LMBE-450
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主真空室
Primary vacuum chamber
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球形结构，尺寸Ф450mm
Sphere structure, size Ф450mm
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进样室
Loading chamber
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筒型卧式结构，尺寸Ф150×300mm
Vertical cylindrical structure, size Ф150×300mm
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真空系统配置
Vacuum system feature
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主真空室
Primary vacuum chamber
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机械泵、分子泵、离子泵、升华泵、阀门
Mechanical pump, molecular pump, ion pump, sublimation pump, valve
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进样室
Loading chamber
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机械泵、分子泵、阀门
Mechanical pump, molecular pump, valve
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极限压力
Ultimate pressure
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主真空室
Primary vacuum chamber
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≤5.0x10-8Pa（经烘烤除气后）
≤5.0x10-8Pa(after baking and degassing)
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进样室
Loading chamber
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≤5X10-5Pa（经烘烤除气后）
≤5X10-5Pa(after baking and degassing)
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恢复真空时间
Time required to reacquire vacuum
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主真空室
Primary vacuum chamber
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20分钟可达到5x10-3 Pa（系统短时间暴露大气并充干燥氮气开始抽气）
5x10-3 Pa in 20 mins (pumping after short exposure to air and filled with helium)
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进样室
Loading chamber
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20分钟可达到5x10-3 Pa（系统短时间暴露大气并充干燥氮气开始抽气）
5x10-3 Pa in 20 mins (pumping after short exposure to air and filled with helium)
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旋转靶台
Rotating target
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靶材最大尺寸Φ70mm,每次可以装4块靶材，可实现公转换靶；每块靶材可自转，转速5～60转/分
Max target size Φ70mm, max target load: 4 pcs, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm
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基片加热台
Substrate heating table
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样品尺寸
Sample size
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Ф51
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运动方式
Mode of motion
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基片可连续回转，转速5～60转/分
Substrate rotates continuously, rotation speed:5-60 rpm
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加热
Heating
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基片加热最高温度800℃±1℃
Max substrate heating temperature 800℃±1℃
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气路系统
Gas circuit system
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质量流量控制器1路 1-circuit mass flow controller
全金属角阀1路 1-circuit metallic angle valve
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*
可
选
部
件
Optional accessories
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差分式高能电子衍射仪（RHEED）
Reflection High Energy Electron Diffraction (RHEED)
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高能电源：最高能量25KV，最大束流100μA
High energy power: Max power 25KV, max beam 100μA
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RHEED强度振荡，生长速率监测系统
RHEED intensity oscillation, growth rate monitoring system
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主要由摄像头，硬件，计算机控制软件包等组成
Consists of camera, hardware, computer control system software
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激光束扫描装置
Laser beam scanning device
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二维扫描机械平台，执行两自由度扫描。
2D scanning mechanical platform, performs 2 degree freedom scan
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计算机控制系统
Computer control system
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控制的内容主要有公转换靶、靶自转、样品自转、样品控温、激光束扫描等
To control target changing in revolution motion, target rotation, sample rotation, sample temperature control, laser beam scanning etc.
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四极质谱仪
Quadrupole mass spectrometer (QMS)
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质量数：1～100
Mass number:1-100
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设备占地面积
Space occupied
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主机
Main unit
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1300×850mm2
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电控柜
Electric cabinet
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700×700mm2（两个）(Two)
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