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LLJGP-560 magnetron sputtering
Category: Sputtering System


      Used for the growth of  nano scale single/multi-layer functional films including various hard, metallic, semiconductor and dielectric films. The system can be widely used for small volume production and film material R&D by universities and research institutes.


      Sputtering vacuum chamber, magnetron sputtering target, water-cooling substrate heating table, sample loading chamber, sample storage chamber, annealer, backwash target, magnet sample transfer mechanism, gas circuit, pumping system, vacuum measurement system, electrical control system and mounting base.

      ounting base.