技术指标 Technical parameter
1、极限真空度:≤2.6×10-5 Pa (经烘烤除气后);
1、Ultimate vacuum:≤2.6×10-5 Pa (after baking and degassing);
2、系统真空检漏漏率:≤6.6×10-8 Pa.l/S;
2、Leak rate: ≤6.6×10-8 Pa.l/S;
3、系统从大气(暴露大气时充干燥氮气)开始抽气,EB-500型、EB-700型小于30分钟可达到工作真空5.0×10-4 Pa,EB-900型小于20分钟可达到工作真空2.6×10-4 Pa;;
3、Pumping after filling dry nitrogen under atmosphere, EB-500 and EB-700 can reach 5.0×10-4 Pa in less than 30 minutes, EB-900 can reach 2.6×10-4 Pa in less than 20 minutes;
4、蒸发速率: EB-500型:0.1~15Å/sec;EB-700型:0.1~20Å/sec;EB-900型:0.1~30Å/sec;
4、Evaporation rate: EB-500: 0.1~15Å/sec; EB-700: 0.1~20Å/sec; EB-900: 0.1~30Å/sec;
5、膜厚均匀性:Film thickness uniformity
u 膜厚不均匀性≤±5%,Film thickness nonuniformity ≤±5%
u 片间不均匀性≤±5%,inter-substrate nonuniformity ≤±5%
u 批次间不均匀性≤±5%;Batch nonuniformity ≤±5%
6、电子枪及电源:EB-500型、EB-700型:4×25CC水冷坩埚;EB-900型: 4×40CC水冷坩埚;
6、Electron beam and power: EB-500, EB-700: 4×25CC water-cooling crucible;EB-900: 4×40CC water-cooling crucible;
功率: EB-500型:6KW; EB-700型:8KW;EB-900型:10KW;
Power:EB-500:6KW; EB-700:8KW; EB-900: 10KW;
7、石英晶体振荡膜厚监控仪可实现实现多段速率爬升,可编程离散输入/输出,实现电子束蒸发源蒸发速率闭环控制,膜厚显示:0~999.9 kÅ,成膜速率:0~999 Å/s;
7、Quarts oscillator film thickness monitor can achieve multistage speed increase, programmable discrete input/output, evaporation rate loop control of E-beam source, film thickness display: 0~999.9 kÅ, film forming rate: 0~999 Å/s;
8、基片架:Substrate Frame
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EB-500型(单拱型)
Eb-500(single arch)
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EB-700型(星型)
EB-700(star)
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EB-900型(星型)
EB-900(star)
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2吋
2″
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30片/次
30 pcs/time
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42×3=126片/次
42×3=126 pcs/time
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67片×3=201片/次
67×3=201 pcs/time
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3吋
3″
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18片/次
18 pcs/time
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23×3=69片/次
23×3=69 pcs/time
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37片×3=111片/次
37×3=111 pcs/time
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4吋
4″
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8片/次
8 pcs/time
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18×3=54片/次
18×3=54 pcs/time
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21片×3=67片/次
21×3=67 pcs/time
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5吋
5″
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8×3=24片/次
8×3=24 pcs/time
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17片×3=51片/次
17×3=51 pcs/time
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6吋
6″
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6×3=18片/次
6×3=18 pcs/time
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12片×3=36片/次
12×3=36 pcs/time
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8吋
8″
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4×3=12片/次
4×3=12 pcs/time
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6片×3=18片/次
6×3=18 pcs/time
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9、光加热系统:加热温度由室温~300℃连续可调;
9、light-heating system: adjustable continuously from room temperature to 300℃.
10、抽气系统:低温泵+罗茨泵组(或机械泵)+气动挡板阀组成;
10、Vacuum pumping system: consists of cryopump, roots pump(or mechanical pump) and pneumatic baffle valve.
11、真空测量:全量程真空规,测量范围:大气压~5×10-7Pa,实现真空室排气过程的真空度曲线显示功能;在前级管路上有1支皮拉尼低真空规,实现真空抽气系统安全监控;
11、Vacuum measurement: full scale vacuum gauge, testing range: atmosphere~5×10-7Pa, display vacuum level curve of chamber exhaust process; Vacuum pumping system safety monitoring by installing a Pirani low vacuum gauge on backing pipes;
12、控制系统:系统由工控机和PLC实现对整个系统的控制,有自动和手动控制两种功能,操作过程全部在触摸屏上实现,提供配方设置、真空系统、电子枪系统、工艺系统、充气系统、冷却系统等人机操作界面;在工控机上可通过配方式参数设置方式实现对程序工艺过程和设备参数的设置;
12、Control system: the system is controlled by IPC and PLC, and can be switched between manual and automatic mode. The whole operation process is done on a touch screen, which provides operating UI for formula setting, vacuum system, electron gun system, process system, gasing system and cooling system; The processing procedure and system parameters can be set by setting formula parameter on IPC.
13、设备的可靠性: Reliability
设备的完好率大于90%;设备的MTBF大于400小时;
Equipment perfectness rate>90%; MTBF>400 hours
14、额定总功率:60KW;
14、Rated power: 60KW
15、循环水用量:2m3/h;
15、Circulating water: 2m3/h
16、占地面积:Floor Space
设备尺寸:EB-500型:1600×2000mm2;EB-700型:1800×2200mm2;EB-900型:1600×2700mm2;
Dimension: EB-500: 1600×2000 mm2; EB-700: 1800×2200mm2; EB-900: 1600×2700mm2;
开门后尺寸:EB-500型:2900×3000m2;EB-700型:3200×3400mm2;EB-900型:3200×3700mm2。
With door open: EB-500: 2900×3000m2; EB-700: 3200×3400mm2; EB-900: 3200×3700mm2.