products > SKY VACUUM > CVD System
PECVD 300
Number:
Category: CVD System

    Application

    The device uses a plasma enhanced chemical vapor deposition techniques, the deposition of silicon nitride material on different substrates of optical glass, silicon, quartz and stainless steel, a thin film of amorphous silicon and microcrystalline silicon for the preparation of amorphous and microcrystalline silicon thin film solar cell devices. It can be widely used in universities, research institutes and small batch preparation of thin film materials.


    Structure

    Vacuum reaction chamber, cover components, hot wire frame, substrate heating station, gas path, extraction system, installation of the machine, vacuum measurement and electronic control system and other parts.