型号 Model
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OPVD-450
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真空室
Vacuum chamber
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二个D型真空室，尺寸均约为Φ450×H750；两个真空室的真空系统配置、极限压力、恢复真空时间、热阻蒸发舟及电源、膜厚监测仪、真空室照明装置、烘烤装置、样品台的配置与技术参数指标相同。
Two D shaped vacuum chamber, size: Φ450×H750；chamber specifications are same as the main system
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真空系统配置
Vacuum system feature
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日本进口低温泵、无油涡旋干泵与电磁阀、复合数显真空测量规与计、阀门等。
Japanese cryopump, oil-free scroll dry pump and electromagnetic valve, compound digital-displayed vacuum measurement gauge and meter, valves etc.
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极限压力
Ultimate pressure
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≤2.0×10-5 Pa
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恢复真空时间
Time required to reacquire vacuum
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40分钟可达到1×10-4 Pa
1×10-4 Pa in 40 mins
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电动磁力耦合样品传递装置
Power-driven magnetic coupling sample delivering device
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真空室1
Vacuum chamber 1
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采用磁力耦合line motion传递装置，采用步进电机驱动，设有远程手控控制盒，可控制直线前进后退。
Use magnetic coupling line motion delivering device, driven by stepper motor, equipped with remote manual control box, to control linear forward/backward
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有机蒸发源及电源
Organic evaporation source and power
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真空室1
Vacuum chamber 1
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新型OEL升华型蒸发源9支，每支蒸料可装10CC，室温—800℃ 7支，室温—1000℃2支；蒸发源电源4台。
9 New model OEL sublimation evaporation source, each filled with 10CC evaporation material, room temperature-800℃: 7, room temperature-1000℃; evaporation source power: 4
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真空室2
Vacuum chamber 2
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新型OEL升华型蒸发源6支，每支蒸料可装10CC，室温—800℃ 6支；蒸发源电源3台。
6 New model OEL sublimation evaporation source, each filled with 10CC evaporation material, room temperature-800℃: 6; evaporation source power: 3
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热阻蒸发舟及电源
Heat resistance evaporation boat and power
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新型蒸发舟：2组（热阻蒸发舟）；数字式热阻蒸发电源：1台，带有细调功能（0.1安培）；镀铝专用盒式蒸发舟：2个；普通金属蒸发舟：10个；蒸发源挡板：2套。
New model evaporation boat: 2 (heat resistance evaporation boat); digital heat resistance evaporation power: 1, with fine adjustment function (0.1A); aluminum coated special purpose box evaporation boat: 2; metal evaporation boat: 10; evaporation source baffle: 2.
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膜厚监测仪（Filtech SQM200）
Film thickness monitor（Filtech SQM200）
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厚度分辨率
Thickness resolution ratio
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不平均：0.0133埃/测量；50个样品平均：0.002埃/测量
Non-uniformity: 0.0133Å/measure; 50 samples average: 0.002Å/measure
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速率分辨率
Velocity resolution ratio
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不平均：0.0133埃/秒；50个样品平均：0.02埃/秒
Non-uniformity: 0.0133Å/sec; 50 samples average: 0.02 Å/sec
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精度
Precision
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0.03HZ/测量，2ppm
0.03HZ/measure, 2ppm
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速度
Speed
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每秒测量十次
Measuring 10 times per second
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真空室照明装置
Vacuum chamber lighting device
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采用LED外照明方式,避免镀膜污染照明灯
LED lighting outside chamber, to prevent film coating contaminate lighting
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烘烤装置
Baking device
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在真空室外烘烤带的烘烤方式
Baking with hot wire outside vacuum chamber
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样品台
Sample table
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样品尺寸
Substrate size
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可放置一块100×100mm或者50×50mm基片
Load one 100×100mm or 50×50mm substrate
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运动方式
Mode of motion
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可电动上下升降，可旋转，转速为0-30转/分，转速可调
Power driven lifting, rotatable, rotating speed 0-30rpm, rotating speed adjustable
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